MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded 1-0704 - イベントレポートスタンダードへのSECS-Ⅱ のサポート

1-0704 - イベントレポートスタンダードへのSECS-Ⅱ のサポート

The purpose is to:

SEMI D20-1000 (technical revision)

This Standard limits the kinds of activities that may occur near the load face plane of the equipment

MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded 1-0704 - イベントレポートスタンダードへのSECS-Ⅱ のサポート1 Purpose 1. 1 This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Youngs modulus. 2 Scope 2. 1 This Test Method presents a procedure for measuring step heights of thin films using step height test