P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive This Test Method requires the

This Test Method requires the use of an oxygen-free reference specimen

前方の支持機構（フロントリテイニングフィーチャ）

These mounting requirements may be used in other tools used to fabricate or measure EUV masks

the types of liquid chemicals listed below:

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive This Test Method requires theNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements of the glass substrate for hard surface photomasks. This Document covers square photomasks up to 7 inches in length.