F04200 - SEMI F42 - Test Method for Semiconductor Processing Equipment Voltage Sag Immunity Revision:SEMI F42-0200 - Replaced このため本仕様により，

このため本仕様により，

This Test Method describes a procedure

• To identify and define key properties of EUV substrates and blanks which should be specified in the purchase order between users and suppliers

The polarizer size or aperture is not limited in this Test Method

F04200 - SEMI F42 - Test Method for Semiconductor Processing Equipment Voltage Sag Immunity Revision:SEMI F42-0200 - Replaced このため本仕様により，NOTICE: This Document is no longer supported by the global technical committee. It has been replaced by SEMI F47. The purpose of this Document is to define the test method used to characterize the susceptibility of semiconductor processing, metrology, and automated test equipment to voltage sags. This Document defines the testing procedures and test equipment required to characterize the susceptibility of equipment to voltage sags by showing voltage