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Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room -Size: (LxWxT) 25 mm x
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room -Size: (LxWxT) 25 mm x
$35.11
Description
-Size: (LxWxT) 25 mm x 25 mm x 0
Material: LiNiCoMnO2
Dimensions 287 × 170 × 175 (mm)
1500 Kgf/cm2 (TD)
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room -Size: (LxWxT) 25 mm xSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area:
Shipping Notes
- Free Standard Shipping on $100+ Orders to the USA.
- Except Preorder products are shipped in 48 hours.
- Delivery to the USA:
- Standard Shipping : 3-10 business days
- If time is of the essence, please consider selecting expedited delivery for faster service.
 on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room -Size: (LxWxT) 25 mm x){kind=link}
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